Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers

The directed self-assembly (DSA) of block copolymers (BCPs) is a powerful method for the manufacture high-resolution features. Critical issues remain to be addressed successful implementation DSA, such as dewetting and controlled orientation BCP domains through physicochemical manipulations at interfaces, spatial positioning registration Here, we introduce novel top-coat (TC) materials designed undergo cross-linking reactions triggered by thermal or photoactivation processes. cross-linked TC layer with adjusted composition induces mechanical confinement layer, suppressing its while promoting perpendicular domains. selection areas interest features performed directly on patternable via lithography step leverages attractive integration pathways generation locally patterns nanostructured multilayers.